Learning to Filter Outlier Edges in Global SfM
Damblon, Nicole and Pollefeys, Marc and Baráth, Dániel (2025) Learning to Filter Outlier Edges in Global SfM. In: 2025 IEEE/CVF Conference on Computer Vision and Pattern Recognition (CVPR). IEEE, Piscataway (NJ), pp. 11558-11568. ISBN 9798331543648 10.1109/CVPR52734.2025.01079
|
Text
Damblon_11558_36380210_z.pdf Restricted to Registered users only Download (853kB) | Request a copy |
Official URL: https://doi.org/10.1109/CVPR52734.2025.01079
| Item Type: | Book Section |
|---|---|
| Subjects: | Q Science > QA Mathematics and Computer Science > QA75 Electronic computers. Computer science / számítástechnika, számítógéptudomány |
| Divisions: | Machine Perception Research Laboratory |
| SWORD Depositor: | MTMT Injector |
| Depositing User: | MTMT Injector |
| Date Deposited: | 18 Dec 2025 08:53 |
| Last Modified: | 18 Dec 2025 08:53 |
| URI: | https://eprints.sztaki.hu/id/eprint/11006 |
![]() |
Update Item |



